Rotary Plasma Modification Equipment
The Rotary Plasma Modification Equipment integrates technologies of both powder atomic layer deposition (ALD) and plasma powder modification. These two functions can be employed either individually or in combined ways.

The equipment applies low-pressure plasma discharge technology within the powder processing chamber. By ionizing the chamber gas, it generates reactive species (electrons and positive/negative ions). These energetic particles collide with powder surfaces, increasing surface defect concentration to achieve etching, doping, grafting and cleaning effects. The technology combines plasma powder modification with ALD to enhance the deposition process. This energy-assisted atomic layer deposition method employs highly reactive plasma species as precursors, typically using plasma to replace conventional reactants for reaction with Precursor A.



